This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: International Business Machines Corporation. Active years: 2014.
Company Filing History:
Years Active: 2014
Title: Joseph Paki - Innovator in VLSI Mask Correction
Introduction
Joseph Paki is a notable inventor based in Troy, NY (US). He has made significant contributions to the field of very large scale integrated (VLSI) semiconductor devices. His innovative work focuses on improving the production processes of these devices, which are essential in modern electronics.
Latest Patents
Joseph Paki holds a patent for "Polygon recovery for VLSI mask correction." This invention relates to the recovery of polygons from a +1/−1 description of a plurality of polygons of a VLSI mask. The patent outlines a method that includes receiving a set of data comprising the +1/−1 description, determining a 4-directional data structure, and recovering the polygons by assigning corners to single polygons based on specific values.
Career Highlights
Joseph Paki is associated with International Business Machines Corporation (IBM), where he applies his expertise in semiconductor technology. His work has contributed to advancements in VLSI design and manufacturing processes, enhancing the efficiency and effectiveness of semiconductor devices.
Collaborations
Throughout his career, Joseph has collaborated with talented individuals such as Patrick Droz and Paul T Hurley. These collaborations have fostered innovation and have led to the development of cutting-edge technologies in the semiconductor industry.
Conclusion
Joseph Paki's contributions to VLSI mask correction demonstrate his commitment to advancing semiconductor technology. His innovative patent and collaborations highlight his role as a key figure in the field.