Aurora, IL, United States of America

Joseph P Pircon

This inventor holds 1 USPTO granted patent. Top assignee: Benetech, Inc.. Active years: 2004.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Joseph P Pircon. Retrieved from https://idiyas.com/inventor/joseph-p-pircon

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 30(Granted Patents)


Company Filing History:


Years Active: 2004

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1 patent (USPTO):Explore Patents

Title: Patent Innovations by Joseph P. Pircon

Introduction

Joseph P. Pircon is an innovative inventor based in Aurora, Illinois. He holds a significant patent that brings a novel approach to dust control, showcasing his contributions to environmental safety and material handling.

Latest Patents

Joseph's prominent patent, titled "Control of Dust," presents a method for suppressing dust emanation from dust-bearing materials. The inventive process involves applying a dust suppressant composed of molasses-derived protein, effectively minimizing dust emissions and improving air quality in various applications.

Career Highlights

Joseph Pircon has made noteworthy strides in his career at Benetech, Inc., a company dedicated to providing innovative solutions for material handling and dust control. His work has not only advanced the field but has also positioned him as a prominent figure in the industry.

Collaborations

In his professional journey, Joseph collaborates with talented individuals such as Andrew Wolff and Mark E. Freetly. These partnerships foster creativity and innovation, enhancing the research and development initiatives at Benetech, Inc.

Conclusion

Joseph P. Pircon's contributions to dust control technology reflect his dedication to innovation and improvement of industrial practices. Through his patent and collaborations, he continues to impact both the environment and the field of material handling positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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