Location History:
- Cupertino, CA (US) (2001)
- Sunnyvale, CA (US) (1999 - 2003)
- Oakland, CA (US) (2002 - 2004)
- Lafayette, CA (US) (2002 - 2005)
Company Filing History:
8 out of 13,684 
2 out of 832,680 Years Active: 1999-2005
Title: Joseph P. Caulfield: Pioneering Innovations in Etching Processes
Introduction
Joseph P. Caulfield, an accomplished inventor based in Oakland, CA, has made significant contributions to the field of plasma etching technology. With a total of 10 patents to his name, his innovative work primarily focuses on enhancing selective etching processes, particularly for oxide over nitride compositions. His inventive spirit and expertise undoubtedly place him among the notable figures in the realm of semiconductor manufacturing.
Latest Patents
Among Joseph P. Caulfield's latest patents is a highly selective process for etching oxide over nitride using hexafluorobutadiene. This advanced oxide etching process is especially beneficial for selectively etching oxide over features with a non-oxide composition, such as silicon nitride. This invention addresses challenges associated with corner faceting during etching, using a heavy perfluorocarbon in conjunction with a noble gas to create a high-density plasma. Additionally, he has developed a method for enhancing silicon oxide etch rates and nitride selectivity by using hexafluorobutadiene combined with xenon gas, thus minimizing the risk of etch stops and faceting.
Career Highlights
Joseph P. Caulfield has held key positions within leading companies such as Applied Materials, Inc., where he has focused on developing innovative etching technologies. His expertise in plasma processes has contributed significantly to advancements in semiconductor fabrication, positioning him as a valuable asset in his field. His continued dedication to innovation has led to numerous patents that enhance the efficiency and precision of etching processes.
Collaborations
Throughout his career, Joseph has collaborated with numerous talented individuals in the industry, including esteemed coworkers Ruiping Wang and Gerald Z. Yin. These collaborations have fostered an environment of innovation, leading to the successful development of critical technologies in plasma etching.
Conclusion
Joseph P. Caulfield's work in etching technology showcases the importance of innovation and collaboration in driving advancements within the semiconductor industry. His patents not only illustrate his inventive prowess but also contribute significantly to the efficiency and capability of modern etching processes. As a prominent inventor based in Oakland, CA, he continues to inspire future generations of inventors and engineers in the pursuit of technological excellence.
Inventor’s Patent Attorneys refers to legal professionals with specialized expertise in representing inventors throughout the patent process. These attorneys assist inventors in navigating the complexities of patent law, including filing patent applications, conducting patent searches, and protecting intellectual property rights. They play a crucial role in helping inventors secure patents for their innovative creations.