Company Filing History:
Years Active: 2008-2018
Title: Joseph M. Blecher: Innovating in Photomask Technology
Introduction
Joseph M. Blecher, an accomplished inventor based in San Jose, CA, has made significant contributions to the field of photomask technology. With a total of six patents to his name, Blecher's work focuses on the monitoring and inspection of reticles used in photolithography processes. His innovative approach has addressed key challenges in defect detection and reporting, making strides in the semiconductor manufacturing industry.
Latest Patents
Blecher's recent patents reflect his expertise in monitoring changes in photomask defectivity. His innovations include a method for inspecting a reticle within specifications to generate a baseline of candidate defects, identifying their location and size. After the reticle is utilized in photolithography, it undergoes a subsequent inspection to generate current candidate defects, allowing for an inspection report that filters and categorizes these defects into two subsets: the first subset contains defects that do not match any baseline candidates, while the second subset includes defects that do match baseline specifications.
Another significant patent addresses the generation of baseline events for unusual reticle features. This process involves an analysis to produce current events post-use, effectively tracking changes in reticle features over time. His findings culminate in an inspection report highlighting discrepancies between baseline and current events, further enhancing the efficiency of defect management in the photomask industry.
Career Highlights
Joseph M. Blecher is currently employed at KLA Tencor Corporation, a prominent player in the semiconductor and electronics manufacturing space. His role has placed him at the forefront of innovative developments that drive quality control in photolithography processes. Blecher's commitment to excellence and his deep technical knowledge have paved the way for numerous advancements in the industry.
Collaborations
Throughout his career, Blecher has had the privilege of collaborating with esteemed colleagues, including Carl Hess and Chun Guan. These partnerships have fostered an environment of shared knowledge and innovation, amplifying the impact of their combined efforts in advancing photomask technology.
Conclusion
In summary, Joseph M. Blecher stands out as a pivotal inventor in the realm of photomask technology. His six patents illustrate his dedication to improving defect monitoring systems essential for semiconductor production. Through his work at KLA Tencor Corporation and collaborations with his fellow innovators, Blecher continues to influence and shape the future of the semiconductor manufacturing industry.
Inventor’s Patent Attorneys refers to legal professionals with specialized expertise in representing inventors throughout the patent process. These attorneys assist inventors in navigating the complexities of patent law, including filing patent applications, conducting patent searches, and protecting intellectual property rights. They play a crucial role in helping inventors secure patents for their innovative creations.