New Haven, CT, United States of America

Joseph L Sperrazza

This inventor holds 1 USPTO granted patent. Top assignee: Universal Technology, Inc.. Active years: 1979.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Joseph L Sperrazza. Retrieved from https://idiyas.com/inventor/joseph-l-sperrazza

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 1.0

ph-index = 1

Forward Citations = 8(Granted Patents)


Company Filing History:


Years Active: 1979

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Joseph L. Sperrazza

Introduction

Joseph L. Sperrazza is a notable inventor based in New Haven, Connecticut. He has made significant contributions to the field of optical gaging systems. His innovative work has led to the development of a unique technology that enhances measurement accuracy in various applications.

Latest Patents

Joseph L. Sperrazza holds a patent for an optical gaging system. This electro-optical gaging system features a linear array of photo-sensitive diodes. It measures the thickness of an object against a dark background by determining the number of diodes discharged due to light from the object. Each diode is sequentially scanned during a cycle to recharge the capacitance of the discharged diodes. The number of charging pulses serves as a measurement of the object's thickness. Additionally, a separate photo-sensitive element senses light conditions and generates pulses to maintain system calibration.

Career Highlights

Joseph L. Sperrazza is associated with Universal Technology, Inc., where he applies his expertise in optical systems. His work at the company has been instrumental in advancing measurement technologies. His innovative approach has garnered attention in the industry.

Collaborations

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Conclusion

Joseph L. Sperrazza's contributions to optical gaging systems exemplify the impact of innovation in measurement technology. His work continues to influence the field and enhance accuracy in various applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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