This inventor holds 5 USPTO granted patents. Top assignees: The United States of America as Represented by the United States, Consortium for Surface Processing, Inc.. Active years: 1984-1994.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:

Years Active: 1984-1994
Title: Joseph L. Cecchi: Innovator in Microwave Plasma Processing
Introduction
Joseph L. Cecchi is a notable inventor based in Lawrenceville, NJ (US). He has made significant contributions to the field of microwave plasma processing, holding a total of 5 patents. His work focuses on enhancing the efficiency and uniformity of plasma processing techniques.
Latest Patents
One of his latest patents is an "Apparatus and method for uniform microwave plasma processing using TE.sub.1 - A." This invention describes a plasma processing apparatus that utilizes a specific ratio of power between TE.sub.11 and TM.sub.01 modes to achieve radial uniformity in plasma. The microwave coupler in this apparatus transforms energy from a source into equal proportions of these modes. The design includes a first arm for generating the TE.sub.11 mode and a second arm for the TM.sub.01 mode, which are combined in a cylindrical waveguide. This configuration allows for independent control of the power proportions of each mode. Additionally, a magnetic field generator can create an electron cyclotron resonance condition within the plasma.
Another significant patent is the "Method and apparatus for coupling a microwave source in an electron." This invention involves circularly polarizing microwave energy from a source to align with the magnetic field of an electron cyclotron resonance (ECR) system. The circularly polarized energy is then coupled to the plasma using a quarter wave vacuum window transformer. This transformer is designed to match the impedance of the microwave energy to that of the plasma, optimizing the coupling and minimizing reflected power. This innovation is particularly beneficial for high-density plasmas in standard ECR systems.
Career Highlights
Throughout his career, Joseph L. Cecchi has worked with various organizations, including the United States of America as represented by the United States and Consortium for Surface Processing, Inc. His expertise in microwave plasma processing has positioned him as a key figure in this specialized field.
Collaborations
Joseph has collaborated with notable individuals such as Randall J. Knize and James E. Stevens. These partnerships have contributed to the advancement of his research and innovations in plasma processing technologies.
Conclusion
Joseph L. Cecchi's contributions to microwave plasma processing through his patents and collaborations highlight his role as an influential inventor in the field. His work continues to impact the efficiency and effectiveness of plasma processing techniques.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile