Company Filing History:
Years Active: 1997-2000
Title: Joseph H MacLeish: Innovator in CVD Reactor Technology
Introduction
Joseph H MacLeish is a notable inventor based in San Ramon, CA (US). He holds a total of 5 patents that showcase his contributions to the field of chemical vapor deposition (CVD) technology. His innovative designs have significantly advanced the efficiency and safety of CVD reactors.
Latest Patents
One of his latest patents is the "Susceptor hold-down mechanism." This invention provides a structure and method for securely holding a susceptor in a single-wafer RF heated CVD reactor. It allows the center portion of the susceptor to be heated while preventing damage to both the susceptor and the reactor due to overdriving. The design includes a plug that heats the center portion of the susceptor, ensuring constant temperature gradients. Additionally, the mechanism incorporates springs that relieve stress on the susceptor during thermal expansion, facilitating easy removal and assembly for maintenance.
Another significant patent is the "Gas injection system for CVD reactors." This invention features a CVD reactor with separate reaction and pressure chambers. The gas injection system pre-heats and injects process gases into the reaction chamber in a vertical direction. This innovative approach minimizes undesirable deposition on the reaction chamber's surface and enhances the efficiency of gas flow, thereby improving the overall performance of the reactor.
Career Highlights
Throughout his career, Joseph H MacLeish has worked with various companies, including Mattson Technology, Inc. His experience in the industry has allowed him to develop groundbreaking technologies that have had a lasting impact on CVD processes.
Collaborations
Joseph has collaborated with notable professionals in the field, including Robert D Mailho and Mahesh K Sanganeria. These collaborations have contributed to the advancement of CVD technology and have fostered innovation in the industry.
Conclusion
Joseph H MacLeish is a distinguished inventor whose work in CVD reactor technology has led to significant advancements in the field. His patents reflect a commitment to innovation and excellence, making him a key figure in the industry.
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