Hopewell Junction, NY, United States of America

Joseph F Shephard


Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 60(Granted Patents)


Company Filing History:


Years Active: 1991

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1 patent (USPTO):

Title: Joseph F. Shephard: Innovator in Semiconductor Technology

Introduction

Joseph F. Shephard is a notable inventor based in Hopewell Junction, NY (US). He has made significant contributions to the field of semiconductor technology, particularly in the development of BiCMOS devices. His innovative approach has led to advancements that enhance the performance and efficiency of semiconductor devices.

Latest Patents

Joseph F. Shephard holds a patent for a process of making BiCMOS devices having closely spaced device regions. This patent outlines a method of forming a semiconductor device on a body of semiconductor material with a first doped region of a first conductivity type. The process includes several steps, such as forming a stud over the first doped region and using it as a mask to create a second doped region of a second conductivity type. The method allows for the fabrication of bipolar transistors, insulated gate transistors, and BiCMOS logic, among other semiconductor devices.

Career Highlights

Joseph F. Shephard is associated with the International Business Machines Corporation (IBM), where he has contributed to various projects in semiconductor technology. His work has been instrumental in advancing the capabilities of semiconductor devices, making them more efficient and effective in various applications.

Collaborations

Throughout his career, Joseph has collaborated with notable colleagues, including Shao-Fu S. Chu and San-Mei Ku. These collaborations have fostered innovation and have led to the successful development of new technologies in the semiconductor field.

Conclusion

Joseph F. Shephard's contributions to semiconductor technology, particularly through his patent on BiCMOS devices, highlight his role as an influential inventor in the industry. His work continues to impact the development of advanced semiconductor solutions.

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