Joseph F Cecala

This inventor holds 2 USPTO granted patents. Top assignee: Lockheed Martin Corporation. Active years: 2007-2011.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Joseph F Cecala. Retrieved from https://idiyas.com/inventor/joseph-f-cecala

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 2

Average Co-Inventor Count = 3.0

ph-index = 2

Forward Citations = 32(Granted Patents)

Company Filing History:

2 out of 5,320

Lockheed Martin Corporation

patents

Years Active: 2007-2011

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2 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 8009515 - Ground threat location for an aircraft (2011-08-30),

2. 7164791 - Method and computer program product for identifying and incorporating new output classes in a pattern recognition system during system operation (2007-01-16),

Title: The Innovative Journey of Joseph F Cecala

Introduction: Joseph F Cecala, a talented inventor hailing from Endwell, NY, has made significant contributions to the world of innovation through his creative and groundbreaking ideas.

Latest Patents: Joseph F Cecala's latest patents showcase his commitment to pushing the boundaries of technology and design, with a focus on improving everyday life for people around the globe.

Career Highlights: Throughout his illustrious career, Joseph F Cecala has been recognized for his ingenuity and forward-thinking approach to problem-solving. His inventions have garnered praise for their practicality and impact.

Collaborations: Joseph F Cecala has collaborated with various industry experts, researchers, and engineers to bring his ideas to life. These partnerships have been instrumental in the development and success of his innovative projects.

Conclusion: Joseph F Cecala's passion for innovation and dedication to creating solutions that make a difference highlight him as a prominent figure in the world of inventors. His work continues to inspire and shape the future of technology.

Profile summary based on public USPTO records.

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]