Seoul, South Korea

Joseph Chang

This inventor holds 1 USPTO granted patent. Top assignee: Kabushiki Kaisha Yaskawa Denki. Active years: 2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Joseph Chang. Retrieved from https://idiyas.com/inventor/joseph-chang-2bs5amfc

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2022

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1 patent (USPTO):Explore Patents

Title: Joseph Chang: Innovator in Substrate Support Technology

Introduction

Joseph Chang is a notable inventor based in Seoul, South Korea. He has made significant contributions to the field of substrate support technology. His innovative designs have the potential to enhance various industrial applications.

Latest Patents

Joseph Chang holds a patent for a substrate support device, substrate conveyance robot, and aligner device. The substrate support device features a blade and at least one pad designed to support a substrate. The pad consists of a first fixed member, a second fixed member, and a flexible bridge. The first fixed member is located at the outer portion of the blade, while the second fixed member is positioned at the inner portion. The bridge connects these two members and is inclined downward when the substrate is not supported, ensuring effective support for the outer circumference of the substrate.

Career Highlights

Joseph Chang is currently employed at Kabushiki Kaisha Yaskawa Denki, where he continues to develop innovative technologies. His work focuses on improving substrate handling and support systems, which are crucial in various manufacturing processes.

Collaborations

Joseph has collaborated with notable colleagues, including Katsuhiko Shimada and Nobuyuki Furukawa. Their combined expertise contributes to the advancement of technology in their field.

Conclusion

Joseph Chang is a prominent inventor whose work in substrate support technology showcases his innovative spirit and dedication to improving industrial processes. His contributions are valuable to the ongoing development of efficient manufacturing solutions.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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