Company Filing History:
Years Active: 1984
Title: Joseph A Mayer, Jr: Innovator in Plasma Etching Technology
Introduction
Joseph A Mayer, Jr. is a notable inventor based in Hamilton, MA (US). He has made significant contributions to the field of semiconductor technology, particularly in the area of plasma etching. His innovative work has led to the development of a unique patent that enhances the efficiency and precision of semiconductor manufacturing processes.
Latest Patents
Mayer holds a patent for a "Plasma etchant mixture - Method and apparatus for masked etching of a polysilicon surface layer or film to expose a dielectric underlying layer or film on a semiconductor material using ion bombardment from an ionized mixture of a fluorine based gas with a chlorine or bromine containing gas." This invention utilizes a mixture of sulfur hexafluoride and Freon 115 gases (C.sub.2 ClF.sub.5) to achieve highly selective etching through the polysilicon film. The method minimizes damage to the underlying dielectric film and reduces undercutting in the polysilicon film, making it a valuable advancement in semiconductor processing.
Career Highlights
Joseph A Mayer, Jr. is associated with Drytek, Inc., where he has applied his expertise in plasma etching technology. His work at Drytek has positioned him as a key player in the development of innovative solutions for the semiconductor industry. Mayer's contributions have been instrumental in advancing the capabilities of semiconductor manufacturing.
Collaborations
Mayer has collaborated with Arthur W Zafiropoulo, a fellow innovator in the field. Their partnership has fostered the exchange of ideas and expertise, further enhancing the impact of their work in semiconductor technology.
Conclusion
Joseph A Mayer, Jr. is a distinguished inventor whose work in plasma etching technology has made a significant impact on the semiconductor industry. His innovative patent demonstrates his commitment to advancing manufacturing processes and improving efficiency.