Arlington, TX, United States of America

Joseph A Abeyta

This inventor holds 1 USPTO granted patent. Top assignee: Respironics, Inc.. Active years: 1997.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Joseph A Abeyta. Retrieved from https://idiyas.com/inventor/joseph-a-abeyta

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 541(Granted Patents)


Company Filing History:


Years Active: 1997

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1 patent (USPTO):Explore Patents

Title: Joseph A. Abeyta: Innovator in Respiratory Mask Technology

Introduction

Joseph A. Abeyta is an accomplished inventor based in Arlington, TX (US). He is known for his innovative contributions to respiratory mask technology, particularly in the design of facial masks that enhance patient comfort and effectiveness.

Latest Patents

Abeyta holds a patent for a respiratory facial mask. This invention features a facial mask assembly designed to cover the nose and nares of a patient's face while compensating for any unequal forces generated by the straps holding the mask in place. The assembly includes a rigid, cup-shaped shell that engages and seals against the patient's face. The design allows for movement to prevent gaps or leaks in the seal, ensuring a secure fit.

Career Highlights

Joseph A. Abeyta is associated with Respironics, Inc., a company renowned for its advancements in respiratory care. His work has significantly contributed to improving the quality of life for patients requiring respiratory support.

Collaborations

Abeyta has collaborated with notable colleagues, including Gregg D. Keefe and Douglas R. Ogden, who have also made significant contributions to the field of respiratory technology.

Conclusion

Joseph A. Abeyta's innovative work in respiratory mask technology exemplifies his commitment to enhancing patient care through effective design. His contributions continue to impact the field positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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