Josef Rapp

Title: Josef Rapp: Innovator in EUV Projection Lithography

Introduction

Josef Rapp is a notable inventor based in Öpfingen, Germany. He has made significant contributions to the field of optical engineering, particularly in the area of EUV projection lithography. With a total of 3 patents to his name, Rapp's work has advanced the capabilities of imaging technologies.

Latest Patents

One of Rapp's latest patents is an imaging optical unit for EUV projection lithography. This innovative unit serves to image an object field into an image field, utilizing mirrors to guide imaging light effectively. The design includes an aperture stop that is tilted by at least 1° in relation to a normal plane, which is perpendicular to the optical axis. The aperture stop features a circular stop contour. In mutually perpendicular planes, the deviation of a numerical aperture measured in one plane from that in another is less than 0.003, averaged over the field points of the image field. This design ensures the homogenization of an image-side numerical aperture, allowing for high structure resolution in the image plane, regardless of the orientation of the imaging light's plane of incidence.

Career Highlights

Josef Rapp is currently employed at Carl Zeiss SMT GmbH, a leading company in optical systems and technologies. His work at this esteemed organization has allowed him to push the boundaries of optical engineering and contribute to cutting-edge innovations in the field.

Collaborations

Rapp collaborates with Johannes Ruoff, a fellow innovator in the industry. Their partnership has fostered advancements in optical technologies and has led to the development of groundbreaking patents.

Conclusion

Josef Rapp's contributions to EUV projection lithography exemplify his dedication to innovation in optical engineering. His patents and collaborations continue to influence the field, showcasing the importance of his work in advancing imaging technologies.