Siivikkala, Finland

Jorma Henttonen

This inventor holds 1 USPTO granted patent and 3 published patent applications and 2 EPO patents. Top assignee: Upm Raflatac Oy. Active years: 2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jorma Henttonen. Retrieved from https://idiyas.com/inventor/jorma-henttonen

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

% Patents Active = 100.0

 

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2021

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1 patent (USPTO):Explore Patents

Title: Jorma Henttonen: Innovator in Label Laminate Technology

Introduction

Jorma Henttonen is a notable inventor based in Siivkkala, Finland. He has made significant contributions to the field of label laminate technology. His innovative approach has led to the development of a unique method for manufacturing label laminates.

Latest Patents

Henttonen holds a patent for a "Label laminate and a method and a system for manufacturing a label laminate." This invention relates to a method that includes forming at least one water-based adhesive layer on a belt, drying the adhesive layer, unwinding a first and a second material layer, and laminating them together to create the label laminate. This method enhances the efficiency and quality of label production.

Career Highlights

Jorma Henttonen is associated with UPM Raflatac Oy, a company known for its innovative solutions in the label and packaging industry. His work has contributed to advancements in manufacturing processes and product quality.

Collaborations

Henttonen has collaborated with notable colleagues such as Risto H Jokinen and Jan-Erik Forsstrom. Their combined expertise has fostered innovation within their projects.

Conclusion

Jorma Henttonen's contributions to label laminate technology exemplify the impact of innovative thinking in manufacturing. His patent and work at UPM Raflatac Oy highlight the importance of advancements in this field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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