Jorg Hunkemeier

Title: Jorg Hunkemeier: Innovator in Measurement Technology

Introduction

Jorg Hunkemeier is a notable inventor based in Zurich, Switzerland. He has made significant contributions to the field of measurement technology, particularly in the development of hand-held devices for appearance analysis. With a total of two patents to his name, Hunkemeier's work is recognized for its innovative approach to capturing visual impressions of measurement objects.

Latest Patents

Hunkemeier's latest patents focus on a hand-held measurement device designed for capturing the visual impression of a measurement object. This device features a measurement array that includes multiple illumination means for applying light to a measurement field from at least three different directions. Additionally, it incorporates several pick-up means for capturing measurement light from at least one observation direction. The design ensures that the illumination and observation directions lie within a common system plane. One of the pick-up means is specifically designed to spectrally gauge the measurement light in a locally integral manner, while another imaging pick-up means gauges the light in terms of color in a locally resolved way. This innovative arrangement allows for accurate measurement light reflection under consistent observation conditions.

Career Highlights

Hunkemeier is currently employed at X-Rite Switzerland GmbH, where he continues to advance his research and development efforts in measurement technology. His work has been instrumental in enhancing the accuracy and efficiency of appearance analysis tools.

Collaborations

Throughout his career, Hunkemeier has collaborated with several talented individuals, including Peter Ehbets and Beat Frick. These collaborations have contributed to the successful development of innovative measurement solutions.

Conclusion

Jorg Hunkemeier stands out as a key figure in the field of measurement technology, with his patents reflecting a commitment to innovation and precision. His contributions continue to influence the industry and pave the way for future advancements in appearance analysis.