Cologne, Germany

Jorg Hagermann

This inventor holds 1 USPTO granted patent. Top assignee: Agfa-Gevaert Ag. Active years: 1998.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jorg Hagermann. Retrieved from https://idiyas.com/inventor/jorg-hagermann

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 1998

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1 patent (USPTO):Explore Patents

Title: Jorg Hagermann: Innovator in Photographic Materials

Introduction

Jorg Hagermann is a notable inventor based in Cologne, Germany. He has made significant contributions to the field of photographic materials, particularly in enhancing the light stability of color photographic silver halide materials.

Latest Patents

Hagermann holds a patent for a color photographic silver halide material that incorporates titanium dioxide (TiO.sub.2) for UV protection. The patent details that the light stability of the material is improved by adding a TiO.sub.2 pigment with a primary particle diameter of 1 to 100 nm to one layer. Additionally, a hydroxyphenylbenzotriazole compound and/or a hydroxyphenyltriazine compound is included in the same or a different layer of the material.

Career Highlights

Jorg Hagermann is associated with Agfa-Gevaert AG, a company renowned for its innovations in imaging technology. His work has contributed to advancements in photographic materials, showcasing his expertise in the field.

Collaborations

Hagermann has collaborated with Arno Schmuck, further enhancing the development of photographic materials through their combined efforts.

Conclusion

Jorg Hagermann's innovative work in photographic materials, particularly his patented advancements, highlights his significant role in the industry. His contributions continue to influence the field of imaging technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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