Heubach, Germany

Jorg Endler

This inventor holds 1 USPTO granted patent. Top assignee: Carl-Zeiss-Stiftung. Active years: 2000.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jorg Endler. Retrieved from https://idiyas.com/inventor/jorg-endler

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 17(Granted Patents)


Company Filing History:


Years Active: 2000

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1 patent (USPTO):Explore Patents

Title: Jorg Endler: Innovator in Optical Technology

Introduction

Jorg Endler is a notable inventor based in Heubach, Germany. He has made significant contributions to the field of optical technology, particularly through his innovative patent.

Latest Patents

Endler holds a patent for an "Optical mount with UV adhesive and protective layer." This invention involves an assembly that includes a holder and a transparent component capable of transmitting in the ultraviolet spectral region. The component is adhered using an adhesive that is hardenable by UV light with a specific spectral distribution. Additionally, a layer is applied using thin film technology on the transparent component in the adhesive region. This layer transmits UV light suitable for hardening the adhesive while effectively reflecting and/or absorbing UV light within a useful spectral region.

Career Highlights

Jorg Endler is associated with Carl-Zeiss-Stiftung, a prominent organization in the field of optics and precision engineering. His work has contributed to advancements in optical assemblies and adhesive technologies.

Collaborations

Endler has collaborated with notable colleagues, including Harry Bauer and Sascha Kraus, enhancing the innovative environment within his organization.

Conclusion

Jorg Endler's contributions to optical technology through his patent and collaborations highlight his role as an influential inventor in the field. His work continues to impact the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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