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Title: Jooyong Kim: Innovator in Atomic Layer Etching Technology
Introduction
Jooyong Kim is a prominent inventor based in Siheung-si, South Korea. He has made significant contributions to the field of semiconductor manufacturing, particularly through his innovative patent in atomic layer etching methods.
Latest Patents
Jooyong Kim holds a patent for an "Atomic layer etching method using ligand exchange reaction." This method involves several steps, including a substrate providing step, a halogenated thin film forming step, and an etching step. The process allows for the etching of a halogenated thin film by infusing a ligand without a metal or metal precursor into the reaction chamber, enhancing the precision and efficiency of semiconductor fabrication. He has 1 patent to his name.
Career Highlights
Throughout his career, Jooyong Kim has worked with notable companies such as SK Hynix Inc. and Merck Patent GmbH. His experience in these organizations has allowed him to refine his skills and contribute to advancements in technology.
Collaborations
Jooyong Kim has collaborated with esteemed colleagues, including Jae Chul Lee and Hyun Sik Noh. These partnerships have fostered innovation and development in the field of semiconductor technology.
Conclusion
Jooyong Kim's contributions to atomic layer etching technology highlight his role as a key innovator in the semiconductor industry. His work continues to influence advancements in manufacturing processes, showcasing the importance of innovation in technology.