Hwaseong, South Korea

Joowon Lee

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Samsung Display Co., Ltd.. Active years: 2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Joowon Lee. Retrieved from https://idiyas.com/inventor/joowon-lee-peja4yvf

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0


Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2021

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1 patent (USPTO):Explore Patents

Title: Joowon Lee: Innovator in Display Technology

Introduction

Joowon Lee is a prominent inventor based in Hwaseong, South Korea. He has made significant contributions to the field of display technology, particularly through his innovative patent.

Latest Patents

Joowon Lee holds a patent for a display device and method for manufacturing the same. This display device includes a base layer, a plurality of wavelength conversion parts disposed on one surface of the base layer, a partition wall between adjacent wavelength conversion parts with a first refractive index, a cover part with a second refractive index greater than the first, and an image display part on a surface provided by the partition wall and the cover part. He has 1 patent to his name.

Career Highlights

Joowon Lee is currently employed at Samsung Display Co., Ltd., where he continues to work on advancing display technologies. His role at the company allows him to collaborate with other talented professionals in the field.

Collaborations

Some of his notable coworkers include Doohwan Kim and Jaemyong Kim, who contribute to the innovative environment at Samsung Display Co., Ltd.

Conclusion

Joowon Lee's work in display technology exemplifies the spirit of innovation and collaboration in the tech industry. His contributions are paving the way for future advancements in display devices.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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