Gyeongsangbuk-do, South Korea

Joonhyuck Park

This inventor holds 1 USPTO granted patent and 2 published patent applications and 1 EPO patent. Top assignee: Pohang University of Science and Technology Foundation. Active years: 2015.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Joonhyuck Park. Retrieved from https://idiyas.com/inventor/joonhyuck-park

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

 

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2015

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1 patent (USPTO):Explore Patents

Title: Innovations by Joonhyuck Park

Introduction

Joonhyuck Park is a notable inventor based in Gyungbuk, South Korea. He has made significant contributions to the field of nanoparticle technology, particularly in the area of surface modification.

Latest Patents

Joonhyuck Park holds a patent for the "Synthesis of molecular sieves for modifying the surfaces of nanoparticles having amphoteric ions, and application thereof." This invention relates to a method for improving the dispersion of nanoparticles by bonding amphoteric compounds to their surfaces. The resulting nanoparticles exhibit enhanced dispersion properties, electrical stability across a wide pH range, and reduced non-specific adsorption. This innovation opens the door for the development of novel specific substances or sensors.

Career Highlights

Joonhyuck Park is affiliated with the Postech Academy-Industry Foundation, where he continues to advance his research and innovations. His work has garnered attention for its practical applications in various scientific fields.

Collaborations

He has collaborated with notable colleagues, including Sungjee Kim and Jutaek Nam, contributing to the advancement of nanoparticle technology.

Conclusion

Joonhyuck Park's innovative work in nanoparticle surface modification showcases his commitment to advancing technology in this field. His contributions are paving the way for future developments in materials science.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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