Pohang, South Korea

Joong Ho Moon


Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2007

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1 patent (USPTO):Explore Patents

Title: Innovations of Joong Ho Moon in Nano-Scale Patterning

Introduction

Joong Ho Moon is a prominent inventor based in Pohang, South Korea. He has made significant contributions to the field of nano-scale technology, particularly in high-resolution patterning methods. His innovative approach has the potential to advance various applications in nanotechnology.

Latest Patents

Joong Ho Moon holds a patent titled "Method for high resolution patterning using soft X-ray, process for preparing nano device using the same method." This patent describes a method for nano-scale high-resolution patterning of self-assembled monolayers using soft X-rays. The process involves forming an aromatic imine molecular layer with substituents at its terminal rings on a substrate, selectively cleaving bonds to the substituents, and hydrolyzing the aromatic imine molecular layer. This innovative technique enhances the precision of nano-device fabrication.

Career Highlights

Joong Ho Moon is associated with the Postech Foundation, where he continues to explore advancements in nano-scale technologies. His work has garnered attention for its potential applications in various scientific and industrial fields. With a focus on high-resolution patterning, he is paving the way for future innovations in nanotechnology.

Collaborations

Joong Ho Moon collaborates with notable colleagues, including Joon Won Park and Young Hye La. Their combined expertise contributes to the advancement of research and development in their respective fields.

Conclusion

Joong Ho Moon's contributions to nano-scale patterning through his innovative patent demonstrate his commitment to advancing technology. His work at the Postech Foundation and collaborations with esteemed colleagues highlight the importance of teamwork in driving scientific progress.

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