Joon-Suh Park

Title: Innovations of Joon-Suh Park in Optical Metasurface Films

Introduction

Joon-Suh Park is an accomplished inventor based in Cambridge, MA. She has made significant contributions to the field of optical technologies, particularly through her innovative work on optical metasurface films. With one patent to her name, her research has the potential to impact various applications in optics and photonics.

Latest Patents

Joon-Suh Park's notable patent is for an optical metasurface film. This invention includes a flexible polymeric film with a first major surface and a patterned polymer layer. The patterned polymer layer has a first surface that is proximate to the flexible polymeric film and a second nanostructured surface that is opposite the first surface. Additionally, a refractive index contrast layer is adjacent to the nanostructured surface, forming a nanostructured bilayer with a nanostructured interface. This bilayer acts locally on the amplitude, phase, or polarization of light, imparting a light phase shift that varies based on the position of the nanostructured bilayer on the flexible polymeric film. The light phase shift defines a predetermined operative phase profile of the optical metasurface film.

Career Highlights

Throughout her career, Joon-Suh Park has worked with prominent organizations, including 3M Innovative Properties Company and Harvard College. Her experience in these institutions has allowed her to develop her expertise in optical technologies and contribute to groundbreaking research.

Collaborations

Joon-Suh Park has collaborated with notable individuals in her field, including Martin B. Wolk and Robert L. Brott. These collaborations have further enriched her research and innovation efforts.

Conclusion

Joon-Suh Park's work in optical metasurface films exemplifies her innovative spirit and dedication to advancing optical technologies. Her contributions are poised to influence the future of optics and photonics significantly.