This inventor holds 1 USPTO granted patent. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2000.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2000
Title: Joon-ing Kil: Innovator in Aqueous Cleaning Compositions
Introduction
Joon-ing Kil is a notable inventor based in Kyungki-do, South Korea. He has made significant contributions to the field of microelectronics through his innovative patent. His work focuses on methods of employing aqueous cleaning compositions in manufacturing processes.
Latest Patents
Joon-ing Kil holds a patent for "Methods of employing aqueous cleaning compositions in manufacturing." This patent describes aqueous cleaning compositions that comprise from about 0.01 to about 10 weight percent of hydrogen fluoride, from about 1 to about 10 weight percent of hydrogen peroxide, and from about 0.01 to about 30 weight percent of isopropyl alcohol. The methods outlined in the patent involve providing electrodes on insulation films on microelectronic substrates, etching the insulation films using the electrodes as etching masks, and cleaning the exposed surfaces with the specified aqueous cleaning compositions. Notably, the cleaning step and the etching step are carried out simultaneously, enhancing the efficiency of the manufacturing process.
Career Highlights
Joon-ing Kil is currently employed at Samsung Electronics Co., Ltd., where he continues to innovate in the field of microelectronics. His work has contributed to advancements in manufacturing techniques that are crucial for the production of microelectronic devices.
Collaborations
Throughout his career, Joon-ing Kil has collaborated with esteemed colleagues, including Pil-Kwon Jun and Min-sang Yun. These collaborations have fostered a productive environment for innovation and development in their respective fields.
Conclusion
Joon-ing Kil is a prominent inventor whose work in aqueous cleaning compositions has made a significant impact on the microelectronics industry. His innovative methods and collaborations continue to drive advancements in manufacturing processes.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
