Joobyoung Kim

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Electronics Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Joobyoung Kim. Retrieved from https://idiyas.com/inventor/joobyoung-kim-ewxuq5b3

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Joobyoung Kim: Innovator in Optical Proximity Correction

Introduction

Joobyoung Kim is a notable inventor recognized for his contributions to the field of optical proximity correction. He is currently associated with Samsung Electronics Ltd., a leading technology company known for its innovative products and solutions. With a focus on enhancing photomask fabrication methods, Kim has made significant strides in the realm of optical engineering.

Latest Patents

Joobyoung Kim holds a patent for an "Optical Proximity Correction Method and Photomask Fabrication Method Using the Same." This invention addresses critical challenges in photolithography, improving the accuracy and efficiency of semiconductor manufacturing processes. His work in this area has the potential to advance the capabilities of modern electronics.

Career Highlights

Throughout his career, Kim has demonstrated a commitment to innovation and excellence. His role at Samsung Electronics Ltd. has allowed him to collaborate with some of the brightest minds in the industry. His contributions have not only enhanced the company's technological offerings but have also set new standards in optical proximity correction.

Collaborations

Kim has worked alongside talented colleagues, including Heungsuk Oh and Sangwook Kim. Their collaborative efforts have fostered a creative environment that encourages the development of groundbreaking technologies.

Conclusion

Joobyoung Kim's work in optical proximity correction exemplifies the spirit of innovation that drives the technology sector forward. His patent and collaborations highlight the importance of teamwork in achieving significant advancements in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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