Seongnam, South Korea

Joo Bin Park

This inventor holds 2 USPTO granted patents. Top assignee: G2touch Co., Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Joo Bin Park. Retrieved from https://idiyas.com/inventor/joo-bin-park

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 2.0

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Company Filing History:


Years Active: 2026

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2 patents (USPTO):Explore Patents

Title: Joo Bin Park - Innovator in Touch Panel Technology

Introduction

Joo Bin Park is a notable inventor based in Seongnam, South Korea. He has made significant contributions to the field of touch panel technology, particularly with his innovative designs that enhance user interaction.

Latest Patents

Joo Bin Park holds a patent for a "Touch panel with iso-resistance compensation pattern." This invention relates to a touch panel that incorporates a resistive compensation pattern. The touch panel features a matrix of multiple rows and columns of touch electrodes, each connected to sensor signal lines. A touch drive integrated circuit (IC) analyzes touch signals to determine if a touch has occurred. Notably, a dummy signal line is included in the sensor signal lines to ensure resistance matching within an allowable tolerance.

Career Highlights

Joo Bin Park is associated with G2touch Co., Ltd., where he continues to develop and refine touch panel technologies. His work has been instrumental in advancing the functionality and reliability of touch interfaces.

Collaborations

Joo Bin Park collaborates with Ji Woon Won, contributing to the innovative projects at G2touch Co., Ltd. Their teamwork has led to advancements in touch panel technology.

Conclusion

Joo Bin Park's contributions to touch panel technology exemplify his innovative spirit and dedication to enhancing user experience. His patent reflects a significant advancement in the field, showcasing his expertise and commitment to technological progress.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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