Asan-si, South Korea

Jongsu Choi

USPTO Granted Patents = 1 

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2016

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1 patent (USPTO):Explore Patents

Title: The Innovative Journey of Jongsu Choi

Introduction

Jongsu Choi, an inventive mind based in Asan-si, South Korea, has made a notable contribution to the field of substrate cleaning technology. With one patent under his name, Choi showcases his expertise and dedication to improving industrial processes through innovation.

Latest Patents

Choi's prominent patent, titled "Apparatus and Method for Cleaning Substrate," presents a groundbreaking solution for effectively cleaning substrates in various applications. The unique apparatus includes a substrate supporting unit that provides stability, a surrounding container for collecting organic solvent debris, and a fluid supplying unit that sprays a liquid organic solvent with bubbles directly onto the substrate. This innovative design enhances the cleaning process, ensuring efficiency and functionality in various industrial settings.

Career Highlights

Choi is currently employed at Semes Co., Ltd., where he continues to utilize his inventive skills and knowledge. His work at the company emphasizes the practical application of his patent and strengthens the business's capabilities in substrate maintenance and cleaning technologies. Over time, Choi has demonstrated an unwavering commitment to pushing the boundaries of innovation in his field.

Collaborations

Throughout his career, Jongsu Choi has collaborated with fellow innovators, including Yong Hee Lee and Bok Kyu Lee. These professional relationships exemplify the importance of teamwork and collective brainstorming in advancing technology and fostering innovation within the industry.

Conclusion

Jongsu Choi stands as a testament to the power of innovation and dedication in the field of substrate cleaning technology. With his pioneering patent and collaborative efforts, he continues to influence the landscape of industrial processes, setting a high standard for future inventors in the field.

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