Suwon, South Korea

Jongmin Jun

This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignee: Samsung Electronics Ltd.. Active years: 2026.

USPTO Granted Patents = 1 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Jongmin Jun - Innovator in Semiconductor Technology

Introduction

Jongmin Jun is an inventor based in Suwon-si, South Korea. He is known for his work in semiconductor technology, particularly in the design and application of semiconductor devices. His innovative approach aims to enhance the efficiency and functionality of semiconductor components.

Latest Patent Applications

Jongmin Jun has submitted a patent application for a semiconductor device. This device may include a substrate featuring an active pattern, a channel pattern positioned on the active pattern, a source/drain pattern, a gate electrode, and an insulation pattern. The channel pattern consists of semiconductor patterns that are spaced apart and vertically stacked. The lowermost semiconductor pattern is identified as the first semiconductor pattern. The source/drain pattern connects to the semiconductor patterns, while the gate electrode is situated on the semiconductor patterns and comprises multiple inner electrodes located beneath the semiconductor patterns, excluding the first semiconductor pattern. The insulation pattern is positioned between the first semiconductor pattern and the active pattern, incorporating a dielectric pattern and a protection layer. This protection layer is strategically placed between the dielectric pattern and both the first semiconductor pattern and the active pattern.

Conclusion

Jongmin Jun's contributions to semiconductor technology reflect his innovative spirit and dedication to advancing the field. His patent application showcases a sophisticated design that could potentially lead to significant improvements in semiconductor devices.

Profile summary based on public USPTO records.
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