This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Samsung Display Co., Ltd.. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Jonghwan Lee and Thin-Film Thickness Measurement
Introduction
Jonghwan Lee is an inventor based in Yongin, South Korea, and is associated with Samsung Display Co., Ltd. His patent work addresses measuring the thickness of thin films on a substrate using optical reflectance data and fast Fourier transform analysis.
Latest Patents
The provided information lists one patent for Lee: “Plurality Layer Thickness Measuring Device and Method with Fast Fourier Transform.” The invention describes a device that directs light onto a substrate containing multiple thin films and uses a lens and spectrometer to measure reflected light across different wavelengths. A control circuit converts the resulting reflectance spectrum into a digital signal and applies a fast Fourier transform to calculate the thickness of at least one film. The approach is designed to derive thickness measurements from the substrate’s optical response.
Career Highlights
Lee’s listed patent connects optical measurement with signal processing for thin-film analysis. The supplied data identifies 1 patent associated with him and names Samsung Display Co., Ltd. as his company.
Collaborations
The provided information names Yong Jun Park as Lee’s coworker. No further details about their collaboration or shared patent work were supplied.
Conclusion
Jonghwan Lee’s listed invention combines reflectance spectroscopy and fast Fourier transform processing to measure thin-film thickness, reflecting a practical application of optical analysis in display-related technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile