Seongnam, South Korea

JongHwae Lee

This inventor holds 1 USPTO granted patent and 3 published patent applications. Top assignee: Lg Display., Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: JongHwae Lee. Retrieved from https://idiyas.com/inventor/jonghwae-lee-hn0hparb

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

Loading Chart...
1 patent (USPTO):Explore Patents

Title: JongHwae Lee: Inventor of a Moisture-Resistant Display Device.

Introduction

JongHwae Lee is an inventor based in Seongnam, South Korea, and is associated with LG Display Co., Ltd. His listed patent focuses on improving protection and bonding in display devices.

Latest Patents

Lee’s listed patent, “Display Device,” describes a substrate with display and non-display areas, an encapsulation substrate, and multiple dams positioned between them. The first dam, made with epoxy-based resin, is placed in the non-display area, while a second dam made with urethane-based resin is positioned outside it. Together, the dams are designed to limit the entry of moisture and oxygen while increasing bonding force. Lee is credited with 1 patent in the provided information.

Career Highlights

Lee’s documented invention addresses a practical challenge in display-device design: protecting internal components from environmental exposure while maintaining a strong bond between substrates. His work is associated with LG Display Co., Ltd.

Collaborations

The available information connects Lee’s patent work with LG Display Co., Ltd. It does not specify additional collaborators or co-inventors.

Conclusion

JongHwae Lee’s listed invention combines epoxy- and urethane-based dams to help protect a display device from moisture and oxygen while supporting stronger bonding.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…