Suwon-si, South Korea

Jonghun Pi

This inventor holds 3 USPTO granted patents and 1 published patent application. Top assignee: Samsung Electronics Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jonghun Pi. Retrieved from https://idiyas.com/inventor/jonghun-pi-sxc0fwqn

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 3 

% Patents Active = 100.0

Average Co-Inventor Count = 7.3

ph-index = 1


Company Filing History:


Years Active: 2026

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3 patents (USPTO):Explore Patents

Title: Jonghun Pi: Innovator in Radical Density Measurement Technology

Introduction

Jonghun Pi is a notable inventor based in Suwon-si, South Korea. He has made significant contributions to the field of measurement technology, particularly in the area of radical density distribution.

Latest Patents

Jonghun Pi holds a patent for an "Apparatus for measuring radical density distribution based on light absorption and operating method thereof." This innovative apparatus is designed to measure radical spatial density distribution. It includes a process chamber with a viewport, a driving device to move a wall inside the chamber, a light source to generate light, a collimator to transmit and receive light, and a spectrometer to analyze the reflected light. The technology aims to measure radical spatial density by analyzing the absorption amount of the spectrum of the received light. He has 1 patent to his name.

Career Highlights

Jonghun Pi is currently employed at Samsung Electronics Ltd., where he continues to develop and refine his innovative technologies. His work has positioned him as a key player in the advancement of measurement systems.

Collaborations

He collaborates with talented coworkers, including Sejin Oh and Sangki Nam, who contribute to his projects and innovations.

Conclusion

Jonghun Pi's work in radical density measurement technology exemplifies the spirit of innovation. His contributions are paving the way for advancements in measurement systems and their applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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