Jonghee Park

Title: The Innovative Contributions of Jonghee Park

Introduction: Jonghee Park is a notable inventor based in Suwon-si, South Korea, recognized for his significant contributions to the field of materials science and display technology. His innovative work has led to the creation of new compounds that are essential for advancing display devices.

Latest Patents: Jonghee Park holds a patent for a unique phthalocyanine compound which is incorporated into a photosensitive resin composition. This invention not only features the photosensitive resin layer but also includes a color filter and a display device that utilizes this technology. The patent describes the compound's capability to exhibit a shortest wavelength of a full width at half maximum (FWHM) in the range of approximately 600 nm to 620 nm, making it particularly valuable for modern display applications.

Career Highlights: Currently, Jonghee Park is employed at Samsung SDI Co., Inc., a leading company in the field of energy solutions and advanced materials. His role involves the research and development of cutting-edge materials that push the boundaries of technology in display and energy sectors. His expertise and innovations have greatly contributed to his company's position in the market.

Collaborations: Throughout his career, Jonghee Park has collaborated with renowned colleagues such as Myoungyoup Shin and Sooyoung Heo. These partnerships have fostered creativity and led to the development of advanced materials and technologies, enhancing the capabilities of the products they work on.

Conclusion: Jonghee Park's innovative contributions and his patent play a crucial role in the ongoing evolution of display technologies. His work not only demonstrates his ingenuity as an inventor but also highlights the importance of collaboration in advancing scientific research and technological development. As he continues working with talented colleagues at Samsung SDI Co., Inc., the potential for further breakthroughs in this field remains promising.