Suwon-si, South Korea

Jonghee Na

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Electronics Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jonghee Na. Retrieved from https://idiyas.com/inventor/jonghee-na-038fpnjz

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Innovations of Jonghee Na in Display Technology

Introduction

Jonghee Na is a notable inventor based in Suwon-si, South Korea. He has made significant contributions to the field of display technology, particularly through his innovative patent work. His expertise and creativity have positioned him as a valuable asset in the tech industry.

Latest Patents

Jonghee Na holds a patent for a display driving circuit, which includes a compensation control circuit. This circuit generates a compensation voltage based on input image data and information from a display panel. It compensates the data voltage of the input image data using the generated compensation voltage. Additionally, a timing control circuit outputs the compensated data voltage to multiple pixels in the display panel. This innovation enhances the performance and quality of display devices.

Career Highlights

Jonghee Na is currently employed at Samsung Electronics Ltd., a leading company in the electronics sector. His work at Samsung has allowed him to collaborate with other talented professionals in the field. His contributions have been instrumental in advancing display technology.

Collaborations

Some of his notable coworkers include Hyunwook Lim and Taekon Yu. Their collaborative efforts have further enriched the innovative environment at Samsung Electronics.

Conclusion

Jonghee Na's work in display technology exemplifies the impact of innovation in enhancing electronic devices. His patent and contributions reflect a commitment to advancing the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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