Seoul, South Korea

Jongbong Choi

This inventor holds 1 USPTO granted patent. Top assignee: Industry-University Cooperation Foundation Hanyang University. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jongbong Choi. Retrieved from https://idiyas.com/inventor/jongbong-choi-owpako2i

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Jongbong Choi - Innovator in Odor Removal Technology

Introduction

Jongbong Choi is a notable inventor based in Seoul, South Korea. He has made significant contributions to the field of odor removal technology. His innovative approach has led to the development of a unique device aimed at effectively eliminating unwanted odors.

Latest Patents

Jongbong Choi holds a patent for an odor removal device. This device includes a case and an activation device that comes into contact with an object to activate surrounding materials based on the dielectric barrier discharge principle. The activation device features a dielectric with a curved outer surface and an electrode positioned inside, where power is applied to the electrode. This innovative design enhances the efficiency of odor removal.

Career Highlights

Choi is affiliated with the Industry-University Cooperation Foundation at Hanyang University. His work in this institution has allowed him to collaborate with other talented individuals in the field of innovation and technology.

Collaborations

Some of his notable coworkers include Tae Ho Lim and Jung Hyun Kim. Their collective efforts contribute to advancements in technology and innovation.

Conclusion

Jongbong Choi's work in developing an odor removal device showcases his commitment to innovation and problem-solving. His contributions to the field are significant and reflect the potential for further advancements in odor removal technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…