This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Other. Active years: 2022.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2022
Title: Innovations by Jong Yun Lim in Eyewear Technology
Introduction
Jong Yun Lim is an innovative inventor based in Daegu, South Korea. He has made significant contributions to the field of eyewear technology, particularly with his unique approach to eyeglasses. His work focuses on enhancing user experience and personal expression through innovative design.
Latest Patents
Jong Yun Lim holds a patent for "Eyeglasses having selectively detachable pattern layer." This invention relates to eyeglasses that feature a selectively detachable pattern layer. The technology allows for one or more pattern layers with variously shaped images to be attached to the surface of a main lens or an auxiliary lens. This design satisfies the wearers' needs and provides convenience, enabling them to showcase their individuality and expression. Additionally, the invention includes a support mechanism to reduce friction between the main lens or auxiliary lens and the pattern layer.
Career Highlights
Throughout his career, Jong Yun Lim has demonstrated a commitment to innovation in eyewear. His patent reflects a deep understanding of consumer needs and a desire to enhance the functionality and aesthetic appeal of eyeglasses. His work has the potential to revolutionize how individuals interact with their eyewear.
Collaborations
Jong Yun Lim has collaborated with talented individuals in his field, including Myeong Hee Kim and Jong Ho Lim. These collaborations have likely contributed to the development and refinement of his innovative ideas.
Conclusion
Jong Yun Lim's contributions to eyewear technology exemplify the spirit of innovation. His patented design for eyeglasses with a detachable pattern layer not only meets practical needs but also allows for personal expression. His work continues to inspire advancements in the industry.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile