Chungcheongnam-do, South Korea

Jong Won Moon

This inventor holds 2 USPTO granted patents and 1 published patent application. Top assignees: Semes Co., Ltd., Semes Co., Ltd.. Active years: 2023-2026.

USPTO Granted Patents = 2 

% Patents Active = 50.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2023-2026

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2 patents (USPTO):Explore Patents

Title: Jong Won Moon: Innovator in Substrate Treatment Technology

Introduction

Jong Won Moon is a notable inventor based in Chungcheongnam-do, South Korea. He has made significant contributions to the field of substrate treatment technology, particularly through his innovative patent that enhances the efficiency of recycling treating liquids.

Latest Patents

Jong Won Moon holds a patent for a "Unit for recycling treating liquid of substrate and apparatus for treating substrate with the unit." This invention provides a substrate treating liquid recovery unit that boasts improved cleaning efficiency. The apparatus includes a substrate support unit and a recovery unit that surrounds it, designed to recover substrate treating liquid effectively. The first recovery container is equipped with a base for discharging the liquid through a recovery line, along with strategically placed portions and walls to optimize functionality.

Career Highlights

Jong Won Moon is currently employed at Semes Co., Ltd., where he continues to develop innovative solutions in substrate treatment. His work has been instrumental in advancing the technology used in this field, showcasing his commitment to innovation and efficiency.

Collaborations

Some of his coworkers include Ye Jin Choi and Byung Sun Bang, who contribute to the collaborative environment at Semes Co., Ltd. Their teamwork fosters a culture of innovation and shared expertise.

Conclusion

Jong Won Moon's contributions to substrate treatment technology through his patent reflect his dedication to improving industrial processes. His work at Semes Co., Ltd. continues to influence advancements in this important field.

Profile summary based on public USPTO records.
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