Seongnam, South Korea

Jong Suk Won

This inventor holds 1 USPTO granted patent. Top assignee: Semes Co., Ltd.. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jong Suk Won. Retrieved from https://idiyas.com/inventor/jong-suk-won

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: Jong Suk Won: Innovator in Pressure Control Technology

Introduction

Jong Suk Won is a notable inventor based in Seongnam, South Korea. He has made significant contributions to the field of pressure control technology. His innovative approach has led to the development of a unique pressure control device that enhances the stability of air pressure in various applications.

Latest Patents

Jong Suk Won holds 1 patent for his invention titled "Pressure control device and substrate treatment apparatus including the same." This patent provides a solution for stably controlling the internal air pressure of a reservoir. The device features an input terminal for receiving source air pressure, an intake valve, an exhaust valve, a pressure sensor, and a controller that operates both valves simultaneously. This innovative design allows for precise adjustments based on sensed pressure values.

Career Highlights

Jong Suk Won is currently employed at Semes Co., Ltd., where he continues to develop cutting-edge technologies. His work focuses on improving the efficiency and reliability of pressure control systems. His contributions have been instrumental in advancing the capabilities of substrate treatment processes.

Collaborations

Jong Suk Won collaborates with talented colleagues, including Dong Hwa Lee and Bong Man Choi. Together, they work on various projects that aim to push the boundaries of technology in their field.

Conclusion

Jong Suk Won's innovative work in pressure control technology exemplifies the impact of dedicated inventors in advancing industrial applications. His contributions continue to shape the future of substrate treatment and pressure management systems.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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