Suwon-si, South Korea

Jong Sik Oh


Average Co-Inventor Count = 7.1

ph-index = 1

Forward Citations = 10(Granted Patents)


Company Filing History:


Years Active: 2016-2021

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2 patents (USPTO):Explore Patents

Title: Innovator Spotlight: Jong Sik Oh

Introduction

Jong Sik Oh, an accomplished inventor based in Suwon-si, South Korea, holds a remarkable portfolio with two patents to his name. His inventive contributions significantly advance the field of material etching, showcasing his expertise in the development of innovative technologies.

Latest Patents

Among Jong Sik Oh's latest patents is the "Ion Beam Etching Apparatus." This sophisticated device comprises a plasma chamber designed to generate plasma from process gas, an ion-beam source to extract ions, and an etching chamber where the etching process occurs. This invention emphasizes the apparatus's capability to manage radicals through an intricate system of valves and pumps, enhancing the etching precision and efficiency.

Another notable patent is the "Method for Etching Atomic Layer of Graphene." This method details a procedure where reactive radicals are adsorbed onto the graphene surface, followed by the irradiation of an energy source to achieve precise etching. This innovative approach marks a significant advancement in graphene processing techniques.

Career Highlights

Jong Sik Oh is currently affiliated with the Research & Business Foundation at Sungkyunkwan University, where he applies his knowledge to drive innovative research. His work is pivotal in exploring advanced etching methods and their applications in various industries, particularly in electronics and materials science.

Collaborations

Throughout his career, Jong Sik Oh has collaborated with notable colleagues, including Geun Young Yeom and Woong Sun Lim. Their combined efforts in research and development enhance the capabilities of their projects and significantly contribute to the advancement of technology in their field.

Conclusion

Jong Sik Oh's contributions to innovation through his patented technologies exemplify the spirit of invention. His work not only demonstrates technical proficiency but also paves the way for future advancements in material processing and etching technologies. As he continues to push boundaries, the impact of his work will resonate across various sectors, reinforcing the importance of inventors in driving technological progress.

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