This inventor holds 1 USPTO granted patent. Top assignee: Lg Semicon Co., Ltd.. Active years: 2000.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2000
Title: Innovations of Jong Sik Kim in Chemical Vapor Deposition Technology
Introduction
Jong Sik Kim is a notable inventor based in Cheongju, South Korea. He has made significant contributions to the field of chemical vapor deposition technology. His innovative work focuses on enhancing the efficiency and effectiveness of heating apparatuses used in this critical process.
Latest Patents
One of Jong Sik Kim's key patents is for a heating apparatus for chemical vapor deposition equipment. This invention is designed to provide a uniform temperature distribution, even for wafers with large surface areas. The heating apparatus includes upper and lower reflection plates, with a heater positioned between them. Additionally, it features a barrier plate that aids in achieving uniform heat distribution while minimizing dust generation and metallic pollution on the wafer. The apparatus also incorporates a heater cover that protects the upper portions of the first reflection plate, the heater, and the barrier plate, as well as their sides. The upper reflection plate is integrally formed with a gas spraying mechanism, further enhancing its functionality.
Career Highlights
Jong Sik Kim is associated with LG Semicon Co., Ltd., where he continues to develop innovative solutions in semiconductor technology. His work has been instrumental in advancing the capabilities of chemical vapor deposition processes, which are essential in the manufacturing of semiconductor devices.
Collaborations
Jong Sik Kim has collaborated with notable colleagues, including Chang Jae Kim and Dong Hyun Kang. These partnerships have fostered a creative environment that encourages the development of cutting-edge technologies in the semiconductor industry.
Conclusion
Jong Sik Kim's contributions to the field of chemical vapor deposition technology exemplify his commitment to innovation. His patented heating apparatus represents a significant advancement in the industry, showcasing his expertise and dedication to improving manufacturing processes.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile