Daejeon, South Korea

Jong-Sik Choi

USPTO Granted Patents = 5 

 

Average Co-Inventor Count = 5.2

ph-index = 1

Forward Citations = 2(Granted Patents)


Location History:

  • Daejeon, KR (2012 - 2015)
  • Seoul, KR (2023)

Company Filing History:


Years Active: 2012-2023

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5 patents (USPTO):Explore Patents

Title: Innovations of Jong-Sik Choi

Introduction

Jong-Sik Choi is a notable inventor based in Daejeon, South Korea. He has made significant contributions to the field of environmental technology, particularly in the treatment of vehicle exhaust gases and formaldehyde absorption. With a total of five patents to his name, Choi's work reflects a commitment to innovation and sustainability.

Latest Patents

Choi's latest patents include advancements in catalyst particles for treating vehicle exhaust gas. These catalyst particles contain semiconductor nanoparticles supported by noble metals, enhancing their effectiveness in reducing harmful emissions. Another significant patent involves a tile designed for removing formaldehyde, utilizing activated carbon as an absorbent. This tile features an activated carbon-in-core structure, which maximizes the absorption of formaldehyde while addressing the issue of oxidation during heat treatment.

Career Highlights

Throughout his career, Jong-Sik Choi has worked with prominent companies such as LG Hausys, Ltd. and LG Chem, Ltd. His experience in these organizations has allowed him to develop and refine his innovative ideas, contributing to advancements in environmental technologies.

Collaborations

Choi has collaborated with talented individuals in his field, including Ju-Hyung Lee and Sun-Joo Kim. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.

Conclusion

Jong-Sik Choi's contributions to innovation in environmental technology are commendable. His patents reflect a dedication to improving air quality and addressing environmental challenges. Through his work, Choi continues to inspire future generations of inventors and researchers.

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