This inventor holds 1 USPTO granted patent. Top assignee: University of California. Active years: 1991.
Company Filing History:
Years Active: 1991
Title: Jong S Yoon: Innovator in Metal Oxide Film Deposition
Introduction
Jong S Yoon is a notable inventor based in Northridge, CA. He has made significant contributions to the field of material science, particularly in the deposition of metal oxide films. His innovative approach has led to advancements in the quality and efficiency of film deposition processes.
Latest Patents
Jong S Yoon holds a patent for a process titled "Controlled high rate deposition of metal oxide films." This patent describes a method for depositing metal oxides through activated reactive evaporation (ARE). The process emphasizes controlling the deposition rate and film quality by adjusting the relative amounts of metal and metal oxide on the target material's surface. By maintaining a high concentration of oxygen in the reaction zone, the method achieves the necessary ratio of metal to metal oxide surface area, providing a continuous measure of film deposition rate and quality.
Career Highlights
Jong S Yoon is affiliated with the University of California, where he continues to engage in research and development in his field. His work has been instrumental in enhancing the understanding and application of metal oxide films in various technologies.
Collaborations
Some of his notable coworkers include Rointan F Bunshah and Chandra V Deshpandey. Their collaborative efforts have contributed to the advancement of research in material sciences.
Conclusion
Jong S Yoon's innovative work in the deposition of metal oxide films showcases his expertise and commitment to advancing technology in material science. His contributions are valuable to both academic and industrial applications.