Location History:
- Cheongju, KR (2005)
- Chungju, KR (2006)
Company Filing History:
Years Active: 2005-2006
Title: Inventor Jong-Rak Park: Innovating Photolithography at Samsung Electronics
Introduction
Jong-Rak Park, a prominent inventor based in Cheongju, South Korea, has made significant contributions to the field of photolithography through his innovative patents. With a total of three patents to his name, Park has focused on enhancing the precision and efficiency of photomasks used in advanced imaging processes.
Latest Patents
Park's latest inventions include a photomask featuring a transparency-adjusting layer, a method of manufacturing this photomask, and an exposure method utilizing the photomask. The innovative design of the photomask incorporates a substrate and a main pattern on one side, with a transparency-adjusting layer on the other. This layer enables modulation of the illumination intensity during the exposure phase of photolithography, ensuring improved accuracy of the pattern formed on the wafer.
Additionally, he has developed methods for designing a phase grating pattern aimed at optimizing illumination during exposure processes. By dividing the area into subcells and randomly assigning phase values, Park’s method enhances the resolution of the photolithographic transcription process. This systematic evaluation allows for the creation of a new phase grating pattern, which plays a crucial role in increasing the fidelity of the imaging results.
Career Highlights
Jong-Rak Park is associated with Samsung Electronics Co., Ltd., a leading technology company known for its innovations in various sectors. His work has positioned him as a key figure in advancing the company's capabilities in photolithographic technology, which is essential for semiconductor fabrication.
Collaborations
Throughout his career, Park has collaborated with talented colleagues such as Seong-Woon Choi and Gi-Sung Yeo. These partnerships have facilitated a rich exchange of ideas and fostered an environment of innovation, contributing to the successful development of cutting-edge solutions in the field.
Conclusion
Jong-Rak Park’s inventive spirit and dedication to improving photolithographic processes reflect his status as a prominent inventor in the technology domain. His patents not only showcase his expertise but also demonstrate the significant impact of his work on the advancement of semiconductor manufacturing technologies.