Jong-kwang Lee

Title: Jong-kwang Lee: Innovator in Display Technology

Introduction

Jong-kwang Lee is a prominent inventor based in Daejeon, South Korea. He has made significant contributions to the field of display technology, holding a total of 2 patents. His work focuses on enhancing the efficiency and functionality of display systems.

Latest Patents

One of Jong-kwang Lee's latest patents is titled "Mask having assist pattern." This invention includes a mask that comprises a circuit area and a pixel area. The circuit area features a circuit pattern, while the pixel area contains a pixel pattern that extends in a length direction, along with an assist pattern located at the end portion of the pixel pattern adjacent to the circuit area.

Another notable patent is "Exposure system, method of forming pattern using the same and method of manufacturing display substrate using the same." This exposure system consists of an exposure apparatus and a phase shift mask. The exposure apparatus emits multi-wavelength light that includes a variety of wavelengths. The phase shift mask is designed with a transparent substrate and a light-blocking layer, which includes openings that expose different parts of the substrate.

Career Highlights

Jong-kwang Lee is currently employed at Samsung Display Co., Ltd., where he continues to innovate in the field of display technologies. His work has been instrumental in advancing the capabilities of display systems, making them more efficient and effective.

Collaborations

Throughout his career, Jong-kwang Lee has collaborated with notable colleagues, including Min Hyuck Kang and Bong-Yeon Kim. These collaborations have contributed to the development of cutting-edge technologies in the display industry.

Conclusion

Jong-kwang Lee is a key figure in the realm of display technology, with a focus on innovative solutions that enhance display systems. His contributions through patents and collaborations reflect his commitment to advancing this vital field.