Company Filing History:
Years Active: 2015
Title: Jong Kuk Lim: Innovator in Nanolithography
Introduction
Jong Kuk Lim is a prominent inventor based in Gwangju, South Korea. He has made significant contributions to the field of nanolithography, particularly through his innovative patent related to silicon pen nanolithography. His work has implications for various applications in materials science and engineering.
Latest Patents
Jong Kuk Lim holds a patent for a method of lithography that utilizes a tip array with multiple pens attached to a backing layer. The tips of these pens can be made from metal, metalloid, or semi-conducting materials, while the backing layer is composed of an elastomeric polymer. This technology allows for a lithography process where the tips are coated with an ink, such as a patterning composition, which is deposited onto a substrate upon contact. The tips can be easily leveled onto the substrate, and this leveling can be monitored optically by observing changes in light reflection.
Career Highlights
Jong Kuk Lim is affiliated with Northwestern University, where he continues to advance his research in nanotechnology. His work has garnered attention for its potential to revolutionize the way lithography is performed, making it more efficient and precise.
Collaborations
He has collaborated with notable researchers in the field, including Chad A. Mirkin and Wooyoung Shim. These collaborations have further enhanced the impact of his work and contributed to advancements in nanolithography.
Conclusion
Jong Kuk Lim is a key figure in the field of nanolithography, with a patent that showcases innovative methods for lithography using silicon pen technology. His contributions are paving the way for future advancements in this critical area of research.