This inventor holds 1 USPTO granted patent. Top assignee: Dacc Co., Ltd.. Active years: 2006.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2006
Title: Jong Hyun Park: Innovator in Carbon-Carbon Composites
Introduction
Jong Hyun Park is a notable inventor based in Kyungnam, South Korea. He has made significant contributions to the field of materials science, particularly in the manufacturing of carbon-carbon composites. His innovative methods have the potential to enhance various applications in industries requiring high-performance materials.
Latest Patents
Jong Hyun Park holds a patent for a "Method for manufacturing carbon-carbon composites." This patent outlines a comprehensive process that includes producing a mat using carbon fiber, carbon fabric, carbon sheet, or staple fiber. The method involves laminating at least three layers of mats, producing a preform using the laminated mats with a needle punching method, and performing a series of thermal treatment processes to densify and shape the preform. The final step includes an oxidation-resistant treatment process to enhance the durability of the shaped preform. He has 1 patent to his name.
Career Highlights
Park is currently associated with Dacc Co., Ltd., where he applies his expertise in developing advanced composite materials. His work has positioned him as a key figure in the innovation of carbon-based materials, contributing to the advancement of technology in this area.
Collaborations
Some of his coworkers include Hyun Kyu Shin and Sang Hyo Park, who collaborate with him on various projects within the company. Their combined efforts contribute to the innovative environment at Dacc Co., Ltd.
Conclusion
Jong Hyun Park's contributions to the field of carbon-carbon composites demonstrate his commitment to innovation and excellence. His patented methods are paving the way for advancements in material science, showcasing the importance of research and development in this critical area.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile