Hwaseong, South Korea

Jong Hwa Lee

This inventor holds 3 USPTO granted patents and 4 published patent applications. Top assignee: Samsung Display Co., Ltd.. Active years: 2023-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jong Hwa Lee. Retrieved from https://idiyas.com/inventor/jong-hwa-lee-aud1vcub

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 3 

% Patents Active = 100.0

Average Co-Inventor Count = 2.1

ph-index = 1

Forward Citations = 1(Granted Patents)


Location History:

  • Hwaseong-si, KR (2023)
  • Yangju-si, KR (2023)

Company Filing History:


Years Active: 2023-2025

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3 patents (USPTO):Explore Patents

Title: Jong Hwa Lee: Pioneering Inventor from Yangju-si, South Korea

Introduction: Jong Hwa Lee is a distinguished inventor hailing from the vibrant city of Yangju-si in South Korea. With a passion for innovation and a keen eye for technological advancements, Lee has made significant contributions to the field of patents and inventions.

Latest Patents: Lee's latest patents showcase his expertise in areas such as electronics, telecommunications, and sustainable energy solutions. His innovative approach to problem-solving is evident in the cutting-edge technologies he has developed.

Career Highlights: Throughout his illustrious career, Jong Hwa Lee has been recognized for his groundbreaking inventions that have pushed the boundaries of what is possible. His commitment to excellence and dedication to his craft have earned him a reputation as a trailblazer in the world of innovation.

Collaborations: Lee has collaborated with leading research institutions, universities, and companies to bring his inventions to life. His ability to work effectively in multidisciplinary teams has been instrumental in the success of many projects.

Conclusion: Jong Hwa Lee's impact on the world of inventions and patents is truly remarkable. His innovative spirit and unwavering determination continue to inspire the next generation of inventors to push the limits of what is possible.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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