Seoul, South Korea

Jong-chul Yoon

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jong-chul Yoon. Retrieved from https://idiyas.com/inventor/jong-chul-yoon-a94k5dx3

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 2016

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1 patent (USPTO):Explore Patents

Title: Jong-chul Yoon: Innovator in Image Processing Technology

Introduction

Jong-chul Yoon is a prominent inventor based in Seoul, South Korea. He has made significant contributions to the field of image processing, showcasing his expertise through innovative patents. His work is particularly recognized in the technology sector, where he is associated with a leading company.

Latest Patents

Jong-chul Yoon holds a patent for an "Image processing method and apparatus therefor." This patent outlines a method that includes obtaining at least one stencil mask region for a current frame. It also involves acquiring a first velocity field corresponding to a radial spreading from a central point of the stencil mask region. The method further details how to determine a pixel value within the stencil mask region based on the final velocity field and display the current frame accordingly. He has 1 patent to his name.

Career Highlights

Yoon is currently employed at Samsung Electronics Co., Ltd., where he continues to push the boundaries of technology. His work at this prestigious company has allowed him to collaborate with other talented professionals in the field.

Collaborations

Some of his notable coworkers include Soo-wan Park and Seung-ho Shin, who contribute to the innovative environment at Samsung Electronics.

Conclusion

Jong-chul Yoon's contributions to image processing technology exemplify his dedication to innovation. His patent reflects a significant advancement in the field, and his work continues to influence the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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