Suwon-si, South Korea

Jong Chul Kim

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jong Chul Kim. Retrieved from https://idiyas.com/inventor/jong-chul-kim-crw9f6qi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Jong Chul Kim and His Substrate Processing Apparatus

Introduction

Jong Chul Kim is an inventor associated with Suwon-si, South Korea, and Samsung Electronics Co., Ltd. His patent work includes an apparatus designed to reduce contamination during substrate processing.

Latest Patents

The available information lists 1 patent for Kim: “Substrate Processing Apparatus.” The invention describes a frame with an internal space and a bottom opening, positioned above two plates. The first plate has multiple holes, while the second plate has multiple holes and at least one raised dam surrounding a hole and extending toward the frame’s internal space. The holes in the two plates are staggered vertically. This arrangement is intended to reduce or minimize contamination of mounting boards.

Career Highlights

Kim’s listed invention addresses contamination control in substrate processing, an important consideration in electronics manufacturing. The patent record connects his work with Samsung Electronics Co., Ltd.

Collaborations

Jung Sik Park is identified as Kim’s coworker. The available information does not specify their roles or describe a particular joint project.

Conclusion

Jong Chul Kim’s listed patent presents a plate-and-dam arrangement intended to limit contamination during substrate processing, reflecting a practical focus on manufacturing equipment.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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