Jong-Bor Wang

Title: Innovations by Jong-Bor Wang in Semiconductor Technology

Introduction

Jong-Bor Wang is a notable inventor based in Taipei, Taiwan. He has made significant contributions to the field of semiconductor technology. His innovative methods have paved the way for advancements in device fabrication.

Latest Patents

Jong-Bor Wang holds a patent for a method for forming a semiconductor device. This patent outlines a comprehensive process that begins with the formation of a first oxide layer on a substrate. Following this, a polycrystalline silicon layer and a polycide layer are formed, along with an optional second oxide layer and a silicon nitride layer. The process includes creating a photoresist pattern on the silicon layer, etching the silicon nitride layer, and isotropically etching the polycide layer to form an undercut. The final steps involve anisotropic etching and the formation of spacers to complete the semiconductor device. This method is designed to prevent the side-wall of the anisotropically etched polycide layer from penetrating the spacer of the semiconductor device.

Career Highlights

Jong-Bor Wang is currently employed at Vanguard International Semiconductor Corporation. His work at this company has allowed him to apply his innovative ideas in a practical setting. His contributions have been instrumental in enhancing semiconductor device fabrication techniques.

Collaborations

Throughout his career, Jong-Bor Wang has collaborated with esteemed colleagues such as Erik S. Jeng and Tzu-Shih Yen. These collaborations have fostered a productive environment for innovation and development in semiconductor technology.

Conclusion

Jong-Bor Wang's contributions to semiconductor technology through his innovative patent demonstrate his expertise and commitment to advancing the field. His work continues to influence the industry and inspire future innovations.