Yongin-si, South Korea

Jong Beom Hong

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Display Co., Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jong Beom Hong. Retrieved from https://idiyas.com/inventor/jong-beom-hong-ycfv869t

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Jong Beom Hong: Innovator in Display Technology

Introduction

Jong Beom Hong is a notable inventor based in Yongin-si, South Korea. He has made significant contributions to the field of display technology, particularly through his innovative patent.

Latest Patents

Jong Beom Hong holds a patent for a display device that includes a display layer with a light-emitting element and a pixel-defining layer. The device also features a touch sensing layer that comprises a touch insulating layer and a reflective pattern. Additionally, it incorporates a light-blocking pattern with a first pattern overlapping the pixel-defining layer and a second pattern overlapping the reflective pattern. Notably, the reflective pattern and the second pattern have different vertical and horizontal lengths in a plan view. This invention showcases his expertise in enhancing display functionalities.

Career Highlights

Jong Beom Hong is currently employed at Samsung Display Co., Ltd., a leading company in the display technology sector. His work at Samsung has allowed him to be at the forefront of innovations in display devices.

Collaborations

He has collaborated with talented coworkers, including Jung Hwan Yi and Soo Dong Kim, contributing to the advancement of display technologies.

Conclusion

Jong Beom Hong's contributions to display technology through his patent reflect his innovative spirit and dedication to enhancing user experiences. His work continues to influence the industry and pave the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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