Jonathan M Mack

Title: Innovations of Jonathan M Mack

Introduction

Jonathan M Mack is an accomplished inventor based in Boylston, MA (US). He holds a total of four patents, showcasing his expertise in the field of polarizers. His innovative work has significantly contributed to advancements in optical technologies.

Latest Patents

Mack's latest patents include an intrinsic polarizer that features a sheet of PVA-type matrix containing vinylene polymer blocks. This sheet defines a pass polarization axis and a block polarization axis perpendicular to it. Light with an electrical vector parallel to the pass polarization axis is substantially transmitted, while light with an electrical vector parallel to the block polarization axis is absorbed by the vinylene blocks. The sheet exhibits a dichroic ratio of more than 100. Another notable patent is an improved method of manufacturing an intrinsic polarizer, referred to as a K-type polarizer. This method involves stretching a polymeric film in two steps, resulting in a polarizer with excellent polarizing and color characteristics, including a dichroic ratio higher than 100.

Career Highlights

Throughout his career, Jonathan M Mack has worked with prominent companies such as Polaroid Corporation and Seiko Epson Corporation. His experience in these organizations has allowed him to refine his skills and contribute to significant advancements in optical technologies.

Collaborations

Mack has collaborated with notable individuals in his field, including Michael K Gerlach and Gerald N Nkwantah. These collaborations have further enriched his work and contributed to the development of innovative solutions in the industry.

Conclusion

Jonathan M Mack's contributions to the field of polarizers and optical technologies are noteworthy. His innovative patents and collaborations reflect his dedication to advancing the industry. His work continues to influence the development of new technologies in the field.